Titanium disilicide ( Ti Si₂) is an

inorganic An inorganic compound is typically a chemical compound that lacks carbon–hydrogen bonds⁠that is, a compound that is not an organic compound. The study of inorganic compounds is a subfield of chemistry known as '' inorganic chemistry''. Inor ...

chemical compound A chemical compound is a chemical substance composed of many identical molecules (or molecular entities) containing atoms from more than one chemical element held together by chemical bonds. A molecule consisting of atoms of only one element ...

titanium Titanium is a chemical element; it has symbol Ti and atomic number 22. Found in nature only as an oxide, it can be reduced to produce a lustrous transition metal with a silver color, low density, and high strength, resistant to corrosion in ...

and

silicon Silicon is a chemical element; it has symbol Si and atomic number 14. It is a hard, brittle crystalline solid with a blue-grey metallic lustre, and is a tetravalent metalloid (sometimes considered a non-metal) and semiconductor. It is a membe ...

Preparation

Titanium disilicide can be obtained from the reaction between titanium or titanium hydride with silicon. :Ti + 2 Si → TiSi₂ It is also possible to prepare it aluminothermically by the ignition of

aluminium powder Aluminium powder is powdered aluminium. This was originally produced by mechanical means using a stamp mill to create flakes. Subsequently, a process of spraying molten aluminium to create a powder of droplets was developed by E. J. Hall in the ...

sulfur Sulfur ( American spelling and the preferred IUPAC name) or sulphur ( Commonwealth spelling) is a chemical element; it has symbol S and atomic number 16. It is abundant, multivalent and nonmetallic. Under normal conditions, sulfur atoms ...

silicon dioxide Silicon dioxide, also known as silica, is an oxide of silicon with the chemical formula , commonly found in nature as quartz. In many parts of the world, silica is the major constituent of sand. Silica is one of the most complex and abundan ...

, and

titanium dioxide Titanium dioxide, also known as titanium(IV) oxide or titania , is the inorganic compound derived from titanium with the chemical formula . When used as a pigment, it is called titanium white, Pigment White 6 (PW6), or Colour Index Internationa ...

or potassium hexafluorotitanate, K₂TiF₆, by electrolysis of a melt of potassium hexafluorotitanate and titanium dioxide, or by reaction of titanium with

silicon tetrachloride Silicon tetrachloride or tetrachlorosilane is the inorganic compound with the formula SiCl4. It is a colorless volatile liquid that fumes in air. It is used to produce high purity silicon and silica for commercial applications. It is a part of the ...

. Another method is the reaction of

titanium tetrachloride Titanium tetrachloride is the inorganic compound with the formula . It is an important intermediate in the production of titanium metal and the pigment titanium dioxide. is a volatile liquid. Upon contact with humid air, it forms thick clouds o ...

with

silane Silane (Silicane) is an inorganic compound with chemical formula . It is a colorless, pyrophoric gas with a sharp, repulsive, pungent smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental ...

dichlorosilane Dichlorosilane, or DCS as it is commonly known, is a chemical compound with the formula H2SiCl2. In its major use, it is mixed with ammonia (NH3) in LPCVD chambers to grow silicon nitride in semiconductor processing. A higher concentration of DC ...

or silicon. :TiCl₄ + 2 SiH₄ → TiSi₂ + 4 HCl + 2 H₂ :TiCl₄ + 2 SiH₂Cl₂ + 2 H₂ → TiSi₂ + 8 HCl :TiCl₄ + 3 Si → TiSi₂ + SiCl₄

Uses

Titanium silicide is used in the semiconductor industry. It is typically grown by means of

salicide The term salicide refers to a technology used in the microelectronics industry used to form electrical contacts between the semiconductor device and the supporting interconnect structure. The salicide process involves the reaction of a metal thi ...

technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.

References

{{Silicides Transition metal silicides Titanium(II) compounds