Chemical Mechanical Planarization
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Chemical Mechanical Planarization
Chemical mechanical polishing (CMP) (also called chemical mechanical planarization) is a process of smoothing surfaces with the combination of chemical and mechanical forces. It can be thought of as a wikt:hybrid, hybrid of chemical etching and free abrasive polishing. It is used in the semiconductor industry to polish semiconductor wafers as part of the integrated circuit manufacturing process. Description The process uses an abrasive and corrosive chemical slurry (commonly a colloid) in conjunction with a polishing pad and retaining ring, typically of a greater diameter than the wafer. The pad and wafer are pressed together by a dynamic polishing head and held in place by a plastic retaining ring. The dynamic polishing head is rotated with different axes of rotation (i.e., not wiktionary:concentric, concentric). This removes material and tends to even out any irregular topography, making the wafer flat or planar. This may be necessary to set up the wafer for the formation of ad ...
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Hybrid
Hybrid may refer to: Science * Hybrid (biology), an offspring resulting from cross-breeding ** Hybrid grape, grape varieties produced by cross-breeding two ''Vitis'' species ** Hybridity, the property of a hybrid plant which is a union of two different genetic parent strains * Hybrid (particle physics), a valence quark-antiquark pair and one or more gluons * Hybrid solar eclipse, a rare solar eclipse type * Hybrid star (other), with properties normally found in different types of stars Technology Transportation * Hybrid vehicle (other), various types of vehicles referred to as hybrids * Hybrid rail, an urban rail service for passengers using lightweight trains * Hybrid rocket, a rocket motor using propellants from two different states of matter * Hybrid shipping container, a container using phase change material in combination with the ability to recharge itself * Hybrid train, a locomotive, railcar, or train that uses an onboard rechargeable energy storage ...
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