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Molecular Vapor Deposition
Molecular vapor deposition is the gas-phase reaction between surface reactive chemicals and an appropriately receptive surface. Often bi-functional silanes are used in which one termination of the molecule is reactive. For example, a functional chlorosilane (R-Si-Cl3) can react with surface hydroxyl groups (-OH) resulting a radicalized (R) deposition on the surface. The advantage of a gas phase reaction over a comparable liquid phase process is the control of moisture from the ambient environment, which often results in cross polymerization of the silane leading to particulates on the treated surface. Often a heated sub-atmospheric vacuum chamber is used to allow precise control of the reactants and water content. Additionally the gas phase process allows for easy treatment of complex parts since the coverage of the reactant is generally diffusion limited. Microelectromechanical Systems (MEMS) sensors often use molecular vapor deposition as a technique to address stiction Sticti ...
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Silane
Silane (Silicane) is an inorganic compound with chemical formula . It is a colorless, pyrophoric gas with a sharp, repulsive, pungent smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon. Silanes with alkyl groups are effective water repellents for mineral surfaces such as concrete and masonry. Silanes with both organic and inorganic attachments are used as coupling agents. They are commonly used to apply coatings to surfaces or as an adhesion promoter. Production Commercial-scale routes Silane can be produced by several routes. Typically, it arises from the reaction of hydrogen chloride with magnesium silicide: : It is also prepared from metallurgical-grade silicon in a two-step process. First, silicon is treated with hydrogen chloride at about 300 °C to produce trichlorosilane, HSiCl3, along with hydrogen gas, according to the chemical equation : The trichlorosilane is then converted to a mixture ...
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Chlorosilane
In inorganic chemistry, chlorosilanes are a group of reactive, chlorine-containing chemical compounds, related to silane () and used in many chemical processes. Each such chemical has at least one silicon-chlorine () bond. Trichlorosilane is produced on the largest scale. The parent chlorosilane is silicon tetrachloride (). Synthesis Hydrochlorosilanes These include chlorosilane , dichlorosilane , and, most importantly trichlorosilane . The idealized equation for the production of trichlorosilane is: : Methylchlorosilanes Methyltrichlorosilane , dimethyldichlorosilane , and trimethylsilyl chloride are produced by the Direct Process, the reaction of methyl chloride with a silicon-copper alloy. Each of these three methylchlorosilanes are common reagents in organosilicon chemistry. Reactions The methylchlorosilanes react with water to produce hydrogen chloride, giving siloxanes. In the case of trimethylsilyl chloride, the hydrolyzed product is hexamethyldisiloxane: : The ana ...
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Hydroxyl
In chemistry, a hydroxy or hydroxyl group is a functional group with the chemical formula and composed of one oxygen atom covalently bonded to one hydrogen atom. In organic chemistry, alcohols and carboxylic acids contain one or more hydroxy groups. Both the negatively charged anion , called hydroxide, and the neutral radical , known as the hydroxyl radical, consist of an unbonded hydroxy group. According to IUPAC definitions, the term ''hydroxyl'' refers to the hydroxyl radical () only, while the functional group is called a ''hydroxy group''. Properties Water, alcohols, carboxylic acids, and many other hydroxy-containing compounds can be readily deprotonated due to a large difference between the electronegativity of oxygen (3.5) and that of hydrogen (2.1). Hydroxy-containing compounds engage in intermolecular hydrogen bonding increasing the electrostatic attraction between molecules and thus to higher boiling and melting points than found for compounds that lack thi ...
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Microelectromechanical Systems
MEMS (micro-electromechanical systems) is the technology of microscopic devices incorporating both electronic and moving parts. MEMS are made up of components between 1 and 100 micrometres in size (i.e., 0.001 to 0.1 mm), and MEMS devices generally range in size from 20 micrometres to a millimetre (i.e., 0.02 to 1.0 mm), although components arranged in arrays (e.g., digital micromirror devices) can be more than 1000 mm2. They usually consist of a central unit that processes data (an integrated circuit chip such as microprocessor) and several components that interact with the surroundings (such as microsensors). Because of the large surface area to volume ratio of MEMS, forces produced by ambient electromagnetism (e.g., electrostatic charges and magnetic moments), and fluid dynamics (e.g., surface tension and viscosity) are more important design considerations than with larger scale mechanical devices. MEMS technology is distinguished from molecular nanotechnol ...
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Stiction
Stiction (a portmanteau of the words '' static'' and ''friction'') is the force that needs to be overcome to enable relative motion of stationary objects in contact. Any solid objects pressing against each other (but not sliding) will require some threshold of force parallel to the surface of contact in order to overcome static adhesion. Stiction is a ''threshold'', not a continuous force. However, stiction might also be an illusion made by the rotation of kinetic friction. In situations where two surfaces with areas below the micrometer scale come into close proximity (as in an accelerometer), they may adhere together. At this scale, electrostatic and/or Van der Waals and hydrogen bonding forces become significant. The phenomenon of two such surfaces being adhered together in this manner is also called stiction. Stiction may be related to hydrogen bonding or residual contamination. Automobiles Stiction is also the same threshold at which a rolling object would begin to slide ...
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Chemical Vapor Deposition
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (electronics), wafer (substrate) is exposed to one or more Volatility (chemistry), volatile wikt:precursor, precursors, which chemical reaction, react and/or chemical decomposition, decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber. Microfabrication processes widely use CVD to deposit materials in various forms, including: Single crystal, monocrystalline, polycrystalline, amorphous, and Epitaxy, epitaxial. These materials include: silicon (Silicon dioxide, dioxide, silicon carbide, carbide, silicon nitride, nitride, silicon oxynitride, oxynitride), carbon (carbon (fiber), fiber, carbon nanofibers, nanofibers, carbon nanot ...
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Industrial Processes
Industrial processes are procedures involving chemical, physical, electrical, or mechanical steps to aid in the manufacturing of an item or items, usually carried out on a very large scale. Industrial processes are the key components of heavy industry. Chemical processes by main basic material Certain chemical process yield important basic materials for society, e.g., (cement, steel, aluminum, and fertilizer). However, these chemical reactions contribute to climate change by emitting carbon dioxide, a greenhouse gas, through chemical reactions, as well as through the combustion of fossil fuels to generate the high temperatures needed to reach the activation energies of the chemical reactions. Cement (the paste within concrete) * Calcination – Limestone, which is largely composed of fossilized calcium carbonate (CaCO3), breaks down at high temperatures into useable calcium oxide (CaO) and carbon dioxide gas (), which gets released as a by-product. This chemical reaction, c ...
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