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Contact Lithography
Contact lithography, also known as contact printing, is a form of photolithography whereby the image to be printed is obtained by illumination of a photomask in direct contact with a substrate coated with an imaging photoresist layer. History The first integrated circuits had features of 200 micrometres which were printed using contact lithography. This technique was popular in the 1960s until it was substituted by proximity printing, where a gap is introduced between the photomask and the substrate. Proximity printing had poorer resolution than contact printing (due to the gap allowing more diffraction to occur) but generated far fewer defects. The resolution was sufficient for down to 2 micrometre production. In 1978, the step-and-repeat projection system appeared. The platform gained wide acceptance due to the reduction of the mask image and is still in use today. Contact lithography is still commonly practiced today, mainly in applications requiring thick photoresist and/or do ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photolithography
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist in certain areas. The exposed areas undergo a chemical change, making them either soluble or insoluble in a developer solution. After development, the pattern is transferred onto the substrate through etching, chemical vapor deposition, or ion implantation processes. Ultraviolet, Ultraviolet (UV) light is typically used. Photolithography processes can be classified according to the type of light used, including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography, extreme ultraviolet lithography ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Microfabrication
Microfabrication is the process of fabricating miniature structures of micrometre scales and smaller. Historically, the earliest microfabrication processes were used for integrated circuit fabrication, also known as "semiconductor manufacturing" or "semiconductor device fabrication". In the last two decades, microelectromechanical systems (MEMS), microsystems (European usage), Micromachinery, micromachines (Japanese terminology) and their subfields have re-used, adapted or extended microfabrication methods. These subfields include microfluidics/lab-on-a-chip, optical MEMS (also called MOEMS), RF MEMS, PowerMEMS, BioMEMS and their extension into nanoscale (for example NEMS, for nano electro mechanical systems). The production of flat-panel displays and solar cells also uses similar techniques. Miniaturization of various devices presents challenges in many areas of science and engineering: physics, chemistry, materials science, computer science, ultra-precision engineering, fabricat ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Polaritons
In physics, polaritons are bosonic quasiparticles resulting from strong coupling of electromagnetic waves (photon) with an electric or magnetic dipole-carrying excitation (state) of solid or liquid matter (such as a phonon, plasmon, or an exciton). Polaritons describe the crossing of the dispersion of light with any interacting resonance. They are an expression of level repulsion (quantum phenomenon), also known as the avoided crossing principle. To this extent polaritons can be thought of as the new normal modes of a given material or structure arising from the strong coupling of the bare modes, which are the photon and the dipolar oscillation. Bosonic quasiparticles are distinct from polarons (fermionic quasiparticle), which is an electron plus an attached phonon cloud. Polaritons violate the weak coupling limit and the associated photons do not propagate freely in crystals. Instead, propagation speed depends strongly on the frequency of the photon. Significant experi ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Plasmon
In physics, a plasmon is a quantum of plasma oscillation. Just as light (an optical oscillation) consists of photons, the plasma oscillation consists of plasmons. The plasmon can be considered as a quasiparticle since it arises from the quantization of plasma oscillations, just like phonons are quantizations of mechanical vibrations. Thus, plasmons are collective (a discrete number) oscillations of the free electron gas density. For example, at optical frequencies, plasmons can couple with a photon to create another quasiparticle called a plasmon polariton. The field of study and manipulation of plasmons is called plasmonics. Derivation The plasmon was initially proposed in 1952 by David Pines and David Bohm and was shown to arise from a Hamiltonian for the long-range electron-electron correlations. Since plasmons are the quantization of classical plasma oscillations, most of their properties can be derived directly from Maxwell's equations. Explanation Plasmons ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Electron Beam Lithography
Electron-beam lithography (often abbreviated as e-beam lithography or EBL) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist (exposing). The electron beam changes the solubility of the resist, enabling selective removal of either the exposed or non-exposed regions of the resist by immersing it in a solvent (developing). The purpose, as with photolithography, is to create very small structures in the resist that can subsequently be transferred to the substrate material, often by etching. The primary advantage of electron-beam lithography is that it can draw custom patterns (direct-write) with sub-10 nm resolution. This form of maskless lithography has high resolution but low throughput, limiting its usage to photomask fabrication, low-volume production of semiconductor devices, and research and development. Systems Electron-beam lithography systems used in commercial application ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Spatial Frequency
In mathematics, physics, and engineering, spatial frequency is a characteristic of any structure that is periodic across position in space. The spatial frequency is a measure of how often sinusoidal components (as determined by the Fourier transform) of the structure repeat per unit of distance. The SI unit of spatial frequency is the reciprocal metre (m−1), (11 pages) although cycle (rotational unit), cycles per (c/m) is also common. In image-processing applications, spatial freque ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Diffraction
Diffraction is the deviation of waves from straight-line propagation without any change in their energy due to an obstacle or through an aperture. The diffracting object or aperture effectively becomes a secondary source of the Wave propagation, propagating wave. Diffraction is the same physical effect as Wave interference, interference, but interference is typically applied to superposition of a few waves and the term diffraction is used when many waves are superposed. Italian scientist Francesco Maria Grimaldi coined the word ''diffraction'' and was the first to record accurate observations of the phenomenon in 1660 in science, 1660. In classical physics, the diffraction phenomenon is described by the Huygens–Fresnel principle that treats each point in a propagating wavefront as a collection of individual spherical wavelets. The characteristic pattern is most pronounced when a wave from a Coherence (physics), coherent source (such as a laser) encounters a slit/aperture tha ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Lift-off (microtechnology)
{{Refimprove, date=June 2011 The lift-off process in microstructuring technology is a method of creating structures (patterning) of a target material on the surface of a substrate (e.g. wafer) using a sacrificial material (e.g. photoresist). It is an additive technique as opposed to more traditional subtracting technique like etching. The scale of the structures can vary from the nanoscale up to the centimeter scale or further, but are typically of micrometric dimensions. Process An inverse pattern is first created in the sacrificial stencil layer (ex. photoresist), deposited on the surface of the substrate. This is done by etching openings through the layer so that the target material can reach the surface of the substrate in those regions, where the final pattern is to be created. The target material is deposited over the whole area of the wafer, reaching the surface of the substrate in the etched regions and staying on the top of the sacrificial layer in the regions, wher ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Etching
Etching is traditionally the process of using strong acid or mordant to cut into the unprotected parts of a metal surface to create a design in intaglio (incised) in the metal. In modern manufacturing, other chemicals may be used on other types of material. As a method of printmaking, it is, along with engraving, the most important technique for old master prints, and remains in wide use today. In a number of modern variants such as microfabrication etching and photochemical milling, it is a crucial technique in modern technology, including circuit boards. In traditional pure etching, a metal plate (usually of copper, zinc or steel) is covered with a waxy ground which is resistant to acid. The artist then scratches off the ground with a pointed etching needle where the artist wants a line to appear in the finished piece, exposing the bare metal. The échoppe, a tool with a slanted oval section, is also used for "swelling" lines. The plate is then dipped in a bath of aci ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photographic Developer
In the Photographic processing, processing of photographic films, plates or papers, the photographic developer (or just developer) is one or more chemicals that convert the latent image to a visible image. Developing agents achieve this conversion by Redox, reducing the silver halides, which are pale-colored, into silver metal, which is black when in the form of fine particles.Karlheinz Keller et al. ''Photography'' in ''Ullmann's Encyclopedia of Industrial Chemistry'', 2005, Wiley-VCH, Weinheim. . The conversion occurs within the gelatine matrix. The special feature of photography is that the developer acts more quickly on those particles of silver halide that have been exposed to light. When left in developer, all the silver halides will eventually be reduced and turn black. Generally, the longer a developer is allowed to work, the darker the image. Chemical composition of developers The developer typically consists of a mixture of chemical compounds prepared as an aqueous solut ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photomask
A photomask (also simply called a mask) is an opaque plate with transparent areas that allow light to shine through in a defined pattern. Photomasks are commonly used in photolithography for the production of integrated circuits (ICs or "chips") to produce a pattern on a thin wafer of material (usually silicon). In semiconductor manufacturing, a mask is sometimes called a reticle. In photolithography, several masks are used in turn, each one reproducing a layer of the completed design, and together known as a mask set. A curvilinear photomask has patterns with curves, which is a departure from conventional photomasks which only have patterns that are completely vertical or horizontal, known as manhattan geometry. These photomasks require special equipment to manufacture. History For IC production in the 1960s and early 1970s, an opaque rubylith film laminated onto a transparent mylar sheet was used. The design of one layer was cut into the rubylith, initially by hand on an i ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Substrate (printing)
Substrate is used in a converting process such as printing or coating to generally describe the base material onto which, e.g. images, will be printed. Base materials may include: * plastic films or foils, * release liner * textiles, * plastic containers * any variety of paper (lightweight, heavyweight, coated, uncoated, paperboard, cardboard, etc.), or * parchment. Electronics Printing processes such as silk-screening and photolithography are used in electronics to produce printed circuit boards and integrated circuits. Some common substrates used are;Rogers & Plett, p. 162 * Glass-reinforced epoxy, eg FR-4 board * Ceramic-PTFE laminate, eg 6010 board * Alumina ceramic * Silicon * Gallium arsenide * Sapphire * Quartz Quartz is a hard, crystalline mineral composed of silica (silicon dioxide). The Atom, atoms are linked in a continuous framework of SiO4 silicon–oxygen Tetrahedral molecular geometry, tetrahedra, with each oxygen being shared between two tet ... Referen ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
