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Plasma Ashing
In semiconductor manufacturing plasma ashing is the process of removing the photoresist (light sensitive coating) from an etched wafer. Using a plasma source, a monatomic (single atom) substance known as a reactive species is generated. Oxygen or fluorine are the most common reactive species. Other gases used are N2/H2 where the H2 portion is 2%. The reactive species combines with the photoresist to form ash which is removed with a vacuum pump. Typically, monatomic oxygen plasma is created by exposing oxygen gas (O2) at a low pressure to high power radio waves, which ionise it. This process is done under vacuum in order to create a plasma. As the plasma is formed, many free radicals and also oxygen ions are created. These ions could damage the wafer due to the electric field build up between the plasma and the wafer surface. Newer, smaller circuitry is increasingly susceptible to these charged particles that can get implanted into the surface. Originally, plasma was generated in ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Semiconductor
A semiconductor is a material with electrical conductivity between that of a conductor and an insulator. Its conductivity can be modified by adding impurities (" doping") to its crystal structure. When two regions with different doping levels are present in the same crystal, they form a semiconductor junction. The behavior of charge carriers, which include electrons, ions, and electron holes, at these junctions is the basis of diodes, transistors, and most modern electronics. Some examples of semiconductors are silicon, germanium, gallium arsenide, and elements near the so-called " metalloid staircase" on the periodic table. After silicon, gallium arsenide is the second-most common semiconductor and is used in laser diodes, solar cells, microwave-frequency integrated circuits, and others. Silicon is a critical element for fabricating most electronic circuits. Semiconductor devices can display a range of different useful properties, such as passing current more easil ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Photoresist
A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas w ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Etching (microfabrication)
Etching is used in microfabrication to chemically remove layers from the surface of a wafer (electronics), wafer during manufacturing. Etching is a critically important process module in fabrication, and every wafer undergoes many etching steps before it is complete. For many etch steps, part of the wafer is protected from the etchant by a "masking" material which resists etching. In some cases, the masking material is a photoresist which has been patterned using photolithography. Other situations require a more durable mask, such as silicon nitride. Etching media and technology The two fundamental types of etchants are liquid-phase ("wet") and plasma (physics), plasma-phase ("dry"). Each of these exists in several varieties. Wet etching The first etching processes used liquid-phase ("wet") etchants. This process is now largely outdated but was used up until the late 1980s when it was superseded by dry plasma etching. The wafer can be immersed in a bath of etchant, wh ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Plasma (physics)
Plasma () is a state of matter characterized by the presence of a significant portion of charged particles in any combination of ions or electrons. It is the most abundant form of ordinary matter in the universe, mostly in stars (including the Sun), but also dominating the rarefied intracluster medium and Outer space#Intergalactic space, intergalactic medium. Plasma can be artificially generated, for example, by heating a neutral gas or subjecting it to a strong electromagnetic field. The presence of charged particles makes plasma electrically conductive, with the dynamics of individual particles and macroscopic plasma motion governed by collective electromagnetic fields and very sensitive to externally applied fields. The response of plasma to electromagnetic fields is used in many modern devices and technologies, such as plasma display, plasma televisions or plasma etching. Depending on temperature and density, a certain number of neutral particles may also be present, in wh ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Monatomic
In physics and chemistry, "monatomic" is a combination of the words "mono" and "atomic", and means "single atom". It is usually applied to gases: a monatomic gas is a gas in which atoms are not bound to each other. Examples at standard conditions of temperature and pressure include all the noble gases (helium, neon, argon, krypton, xenon, and radon), though all chemical elements will be monatomic in the gas phase at sufficiently high temperature (or very low pressure). The thermodynamic behavior of a monatomic gas is much simpler when compared to polyatomic gases because it is free of any rotational or vibrational energy. Noble gases The only chemical elements that are stable single atoms (so they are not molecules) at standard temperature and pressure (STP) are the noble gases. These are helium, neon, argon, krypton, xenon, and radon. Noble gases have a full outer valence shell making them rather non-reactive species. While these elements have been described historical ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Oxygen
Oxygen is a chemical element; it has chemical symbol, symbol O and atomic number 8. It is a member of the chalcogen group (periodic table), group in the periodic table, a highly reactivity (chemistry), reactive nonmetal (chemistry), nonmetal, and a potent oxidizing agent that readily forms oxides with most elements as well as with other chemical compound, compounds. Oxygen is abundance of elements in Earth's crust, the most abundant element in Earth's crust, making up almost half of the Earth's crust in the form of various oxides such as water, carbon dioxide, iron oxides and silicates.Atkins, P.; Jones, L.; Laverman, L. (2016).''Chemical Principles'', 7th edition. Freeman. It is abundance of chemical elements, the third-most abundant element in the universe after hydrogen and helium. At standard temperature and pressure, two oxygen atoms will chemical bond, bind covalent bond, covalently to form dioxygen, a colorless and odorless diatomic gas with the chemical formula ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Fluorine
Fluorine is a chemical element; it has Chemical symbol, symbol F and atomic number 9. It is the lightest halogen and exists at Standard temperature and pressure, standard conditions as pale yellow Diatomic molecule, diatomic gas. Fluorine is extremely Reactivity (chemistry), reactive as it reacts with all other Periodic table, elements except for the light Noble gas, noble gases. It is highly toxicity, toxic. Among the elements, fluorine ranks Abundance of the chemical elements, 24th in cosmic abundance and 13th in crustal abundance. Fluorite, the primary mineral source of fluorine, which gave the element its name, was first described in 1529; as it was added to metal ores to lower their melting points for smelting, the Latin verb meaning gave the mineral its name. Proposed as an element in 1810, fluorine proved difficult and dangerous to separate from its compounds, and several early experimenters died or sustained injuries from their attempts. Only in 1886 did French chemist He ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Vacuum Pump
A vacuum pump is a type of pump device that draws gas particles from a sealed volume in order to leave behind a partial vacuum. The first vacuum pump was invented in 1650 by Otto von Guericke, and was preceded by the suction pump, which dates to antiquity. History Early pumps The predecessor to the vacuum pump was the suction pump. Dual-action suction pumps were found in the city of Pompeii. Arabic engineer Al-Jazari later described dual-action suction pumps as part of water-raising machines in the 13th century. He also said that a suction pump was used in siphons to discharge Greek fire. The suction pump later appeared in medieval Europe from the 15th century. Donald Routledge Hill (1996), ''A History of Engineering in Classical and Medieval Times'', Routledge, pp. 143 & 150-2 Donald Routledge Hill, "Mechanical Engineering in the Medieval Near East", ''Scientific American'', May 1991, pp. 64-69 (cf. Donald Routledge HillMechanical Engineering By the 17th century, water ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Plasma Cleaning
Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma (physics), plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such as air and hydrogen/nitrogen are used. The plasma is created by using high frequency voltages (typically kHz to >MHz) to ionise the low pressure gas (typically around 1/1000 atmospheric pressure), although atmospheric pressure plasmas are now also common. Methods In plasma, gas atoms are excited to higher energy states and also ionized. As the atoms and molecules 'relax' to their normal, lower energy states they release a photon of light, this results in the characteristic “glow” or light associated with plasma. Different gases give different colors. For example, oxygen plasma emits a light blue color. A plasma’s activated species include atoms, molecules, ions, electrons, radical (chemistry), free radicals, metas ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Free Radical
A daughter category of ''Ageing'', this category deals only with the biological aspects of ageing. Ageing Biogerontology Biological processes Causes of death Cellular processes Gerontology Life extension Metabolic disorders Metabolism Old age Time in life {{CatAutoTOC ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Plasma Etching
Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (Plasma (physics), plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, known as etch species, can be either charged (ions) or neutral (atoms and radical (chemistry), radicals). During the process, the plasma generates volatile etch products at room temperature from the chemical reactions between the elements of the material etched and the reactive species generated by the plasma. Eventually the atoms of the shot element embed themselves at or just below the surface of the target, thus modifying the physical properties of the target. Mechanisms Plasma generation A plasma is a high energetic condition in which a lot of processes can occur. These processes happen because of electrons and atoms. To form the plasma electrons have to be accelerated to gain energy. Highly energetic electrons transfer the energy to ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
Semiconductor Device Fabrication
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories (such as Random-access memory, RAM and flash memory). It is a multiple-step Photolithography, photolithographic and physico-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer (electronics), wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. This article focuses on the manufacture of integrated circuits, however steps such as etching and photolithography can be used to manufacture other devices such as LCD and OLED displays. The fabrication process is performed in highly specialized semiconductor fabrication plants, also called foundries or "fabs", with the cen ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] [Amazon] |
