Trimethylsilane is the

organosilicon compound Organosilicon compounds are organometallic compounds containing carbon–silicon bonds. Organosilicon chemistry is the corresponding science of their preparation and properties. Most organosilicon compounds are similar to the ordinary organic co ...

with the formula (CH₃)₃SiH. It is a trialkylsilane. The Si-H bond is reactive. It is less commonly used as a reagent than the related

triethylsilane Triethylsilane is the organosilicon compound with the formula (C2H5)3SiH. It is a trialkylsilane. The Si-H bond is reactive. This colorless liquid is used in organic synthesis as a reducing agent and as a precursor to silyl ethers. As one of the ...

, which is a liquid at room temperature. Trimethylsilane is used in the

semiconductor industry The semiconductor industry is the aggregate of companies engaged in the design and fabrication of semiconductors and semiconductor devices, such as transistors and integrated circuits. It formed around 1960, once the fabrication of semico ...

as precursor to deposit

dielectric In electromagnetism, a dielectric (or dielectric medium) is an electrical insulator that can be polarised by an applied electric field. When a dielectric material is placed in an electric field, electric charges do not flow through the m ...

s and barrier layers via

plasma-enhanced chemical vapor deposition Plasma-enhanced chemical vapor deposition (PECVD) is a chemical vapor deposition process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved in the process, which occur after creat ...

(PE-CVD). It is also used a source gas to deposit TiSiCN hard coatings via plasma-enhanced magnetron sputtering (PEMS). It has also been used to deposit

silicon carbide Silicon carbide (SiC), also known as carborundum (), is a hard chemical compound containing silicon and carbon. A semiconductor, it occurs in nature as the extremely rare mineral moissanite, but has been mass-produced as a powder and crystal ...

hard coatings via low-pressure chemical vapor deposition (LP-CVD) at relatively low temperatures under 1000 °C. It is an expensive gas but safer to use than

silane Silane is an inorganic compound with chemical formula, . It is a colourless, pyrophoric, toxic gas with a sharp, repulsive smell, somewhat similar to that of acetic acid. Silane is of practical interest as a precursor to elemental silicon. Sila ...

(SiH₄); and produces properties in the coatings that cannot be undertaken by multiple source gases containing silicon and carbon.

References

{{reflist Carbosilanes Trimethylsilyl compounds

See also

References