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A remote plasma (also downstream plasma or afterglow plasma) is a
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing
Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface.
Plasma processing techniques include:
* Plasma activation
* Plasma ashing
*Plasma cleaning
* Plasma elec ...
method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.
See also
*Chemical vapor deposition
Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
In typical CVD, the wafer (subst ...
*Corona treatment
Corona treatment (sometimes referred to as air plasma) is a surface modification technique that uses a low temperature corona discharge plasma to impart changes in the properties of a surface. The corona plasma is generated by the application of ...
*List of plasma (physics) applications articles
This is a list of plasma physics topics.
A
* Ablation
* Abradable coating
* Abraham–Lorentz force
* Absorption band
* Accretion disk
* Active galactic nucleus
* Adiabatic invariant
* ADITYA (tokamak)
* Aeronomy
* Afterglow plasma
* Air ...
*Physical vapor deposition
Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and poly ...
*Plasma activation Plasma activation (or plasma functionalization) is a method of surface modification employing plasma processing, which improves surface adhesion properties of many materials including metals, glass, ceramics, a broad range of polymers and textile ...
*Plasma chemistry
Gas phase ion chemistry is a field of science encompassed within both chemistry and physics. It is the science that studies ions and molecules in the gas phase, most often enabled by some form of mass spectrometry. By far the most important appl ...
*Plasma cleaning
Plasma cleaning is the removal of impurities and contaminants from surfaces through the use of an energetic plasma or dielectric barrier discharge (DBD) plasma created from gaseous species. Gases such as argon and oxygen, as well as mixtures such ...
*Plasma-activated bonding Plasma-activated bonding is a derivative, directed to lower processing temperatures for direct bonding with hydrophilic surfaces. The main requirements for lowering temperatures of direct bonding are the use of materials melting at low temperatur ...
*Reactive ion etching
Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The pla ...
References
Plasma processing Semiconductor device fabrication {{Materials-sci-stub