Plasma processing is a plasma-based material processing technology that aims at modifying the chemical and physical properties of a surface. Plasma processing techniques include: *

Plasma activation Plasma activation (or plasma functionalization) is a method of surface functionalization, surface modification employing plasma processing, which improves surface adhesion properties of many materials including metals, glass, ceramics, a broad rang ...

* Plasma ashing * Plasma cleaning * Plasma electrolytic oxidation *

Plasma etching Plasma etching is a form of plasma processing used to fabricate integrated circuits. It involves a high-speed stream of glow discharge (Plasma (physics), plasma) of an appropriate gas mixture being shot (in pulses) at a sample. The plasma source, ...

* Plasma functionalization * Plasma polymerization *

Corona treatment Corona treatment (sometimes referred to as air plasma) is a surface modification technique that uses a low temperature corona discharge plasma to impart changes in the properties of a surface. The corona plasma is generated by the application ...

*Plasma modification Related topics are plasma chemistry,

chemical vapor deposition Chemical vapor deposition (CVD) is a vacuum deposition method used to produce high-quality, and high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (electro ...

, and

physical vapor deposition Physical vapor deposition (PVD), sometimes called physical vapor transport (PVT), describes a variety of vacuum deposition methods which can be used to produce thin films and coatings on substrates including metals, ceramics, glass, and polym ...

processes like sputter deposition, plasma iondoping, vacuum plasmaspraying, and reactive ion etching.

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