|
Photolithographic
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist in certain areas. The exposed areas undergo a chemical change, making them either soluble or insoluble in a developer solution. After development, the pattern is transferred onto the substrate through etching, chemical vapor deposition, or ion implantation processes. Ultraviolet (UV) light is typically used. Photolithography processes can be classified according to the type of light used, including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography (EUVL), and X-ray lithography. The wavelen ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Scanning Probe Lithography
Scanning probe lithography (SPL) describes a set of nanolithographic methods to pattern material on the nanoscale using scanning probes. It is a direct-write, mask-less approach which bypasses the diffraction limit and can reach resolutions below 10 nm. It is considered an alternative lithographic technology often used in academic and research environments. The term ''scanning probe lithography'' was coined after the first patterning experiments with scanning probe microscopes (SPM) in the late 1980s. Classification The different approaches towards SPL can be classified by their goal to either add or remove material, by the general nature of the process either chemical or physical, or according to the driving mechanisms of the probe-surface interaction used in the patterning process: mechanical, thermal, diffusive and electrical. Overview Mechanical/thermo-mechanical Mechanical scanning probe lithography (m-SPL) is a nanomachining or ''nano-scratching'' top-do ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Silicon Wafer
In electronics, a wafer (also called a slice or substrate) is a thin slice of semiconductor, such as a crystalline silicon (c-Si, silicium), used for the fabrication of integrated circuits and, in photovoltaics, to manufacture solar cells. The wafer serves as the substrate for microelectronic devices built in and upon the wafer. It undergoes many microfabrication processes, such as doping, ion implantation, etching, thin-film deposition of various materials, and photolithographic patterning. Finally, the individual microcircuits are separated by wafer dicing and packaged as an integrated circuit. History In the semiconductor industry, the term wafer appeared in the 1950s to describe a thin round slice of semiconductor material, typically germanium or silicon. The round shape characteristic of these wafers comes from single-crystal ingots usually produced using the Czochralski method. Though, silicon wafers were first introduced in the 1940s. By 1960, silicon wafers were ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Interference Lithography
Interference lithography (or holographic lithography) is a technique that uses coherent light (such as light from a laser) for patterning regular arrays of fine features without the use of complex optics, optical systems or photomasks. Basic principle The basic principle is the same as in interferometry or holography. An interference pattern between two or more Coherence (physics), coherent light, light waves is set up and recorded in a recording layer (photoresist). This interference pattern consists of a periodic series of fringes representing intensity minima and maxima. Upon post-exposure photolithography, photolithographic processing, a photoresist pattern corresponding to the periodic intensity pattern emerges. For 2-beam interference, the fringe-to-fringe spacing or period is given by \frac, where is the wavelength and is the angle between the two interfering waves. The minimum period achievable is then half the wavelength. By using 3-beam interference, arrays with hexag ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor Fabrication
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories (such as RAM and flash memory). It is a multiple-step photolithographic and physico-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. This article focuses on the manufacture of integrated circuits, however steps such as etching and photolithography can be used to manufacture other devices such as LCD and OLED displays. The fabrication process is performed in highly specialized semiconductor fabrication plants, also called foundries or "fabs", with the central part being the " clean room". In more advanced semi ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Semiconductor Device Fabrication
Semiconductor device fabrication is the process used to manufacture semiconductor devices, typically integrated circuits (ICs) such as microprocessors, microcontrollers, and memories (such as Random-access memory, RAM and flash memory). It is a multiple-step Photolithography, photolithographic and physico-chemical process (with steps such as thermal oxidation, thin-film deposition, ion-implantation, etching) during which electronic circuits are gradually created on a wafer (electronics), wafer, typically made of pure single-crystal semiconducting material. Silicon is almost always used, but various compound semiconductors are used for specialized applications. This article focuses on the manufacture of integrated circuits, however steps such as etching and photolithography can be used to manufacture other devices such as LCD and OLED displays. The fabrication process is performed in highly specialized semiconductor fabrication plants, also called foundries or "fabs", with the cen ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Integrated Circuit
An integrated circuit (IC), also known as a microchip or simply chip, is a set of electronic circuits, consisting of various electronic components (such as transistors, resistors, and capacitors) and their interconnections. These components are etched onto a small, flat piece ("chip") of semiconductor material, usually silicon. Integrated circuits are used in a wide range of electronic devices, including computers, smartphones, and televisions, to perform various functions such as processing and storing information. They have greatly impacted the field of electronics by enabling device miniaturization and enhanced functionality. Integrated circuits are orders of magnitude smaller, faster, and less expensive than those constructed of discrete components, allowing a large transistor count. The IC's mass production capability, reliability, and building-block approach to integrated circuit design have ensured the rapid adoption of standardized ICs in place of designs using discre ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Nanoimprint Lithography
Nanoimprint lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release. History The term "nanoimprint lithography" was coined in the scientific literature in 1996, when Prof. Stephen Chou and his students published a report in ''Science'', although hot embossing (now taken as a synonym of NIL) of thermoplastics had been appearing in the patent literature for a few years already. Soon after the ''Science'' publication, many researchers developed different variations and implementations. At this point, nanoimprint lithography has been added to the International Technology Roadmap for ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Magnetolithography
Magnetolithography (ML) is a photoresist-less and photomaskless lithography method for patterning wafer surfaces. ML is based on applying a magnetic field on the substrate using paramagnetic metal masks named "magnetic masks" placed on either topside or backside of the wafer. Magnetic masks are analogous to a photomask in photolithography, in that they define the spatial distribution and shape of the applied magnetic field. The fabrication of the magnetic masks involves the use of conventional photolithography and photoresist however. The second component of the process is ferromagnetic nanoparticles (analogous to the photoresist in photolithography, e.g. cobalt nanoparticles) that are assembled over the substrate according to the field induced by the mask which blocks its areas from reach of etchants or depositing materials (e.g. dopants or metallic layers). ML can be used for applying either a positive or negative approach. In the positive approach, the magnetic nanoparticles re ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photography
Photography is the visual arts, art, application, and practice of creating images by recording light, either electronically by means of an image sensor, or chemically by means of a light-sensitive material such as photographic film. It is employed in many fields of science, manufacturing (e.g., photolithography), and business, as well as its more direct uses for art, film and video production, recreational purposes, hobby, and mass communication. A person who operates a camera to capture or take Photograph, photographs is called a photographer, while the captured image, also known as a photograph, is the result produced by the camera. Typically, a lens is used to focus (optics), focus the light reflected or emitted from objects into a real image on the light-sensitive surface inside a camera during a timed Exposure (photography), exposure. With an electronic image sensor, this produces an Charge-coupled device, electrical charge at each pixel, which is Image processing, electro ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Directed Assembly Of Micro- And Nano-structures
Direct may refer to: Mathematics * Directed set, in order theory * Direct limit of (pre), sheaves * Direct sum of modules, a construction in abstract algebra which combines several vector spaces Computing * Direct access (other), a method of accessing data in a database * Direct connect (other), various methods of telecommunications and computer networking * Direct memory access, access to memory by hardware subsystems independently of the CPU Entertainment * Direct (Tower of Power album), ''Direct'' (Tower of Power album) * Direct (Vangelis album), ''Direct'' (Vangelis album) * Direct (EP), ''Direct'' (EP), by The 77s Other uses * Direct (music symbol), a music symbol used in music notation that is similar to a catchword in literature * Nintendo Direct, an online presentation frequently held by Nintendo * Mars Direct, a proposal for a crewed mission to Mars * DIRECT, a proposed space shuttle-derived launch vehicle * DirectX, a proprietary dynamic medi ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Microlithography
Microlithography is a general name for any manufacturing process that can create a minutely patterned thin film of protective materials over a substrate, such as a silicon wafer, in order to protect selected areas of it during subsequent etching, deposition, or implantation operations. The term is normally used for processes that can reliably produce features of microscopic size, such as 10 micrometres or less. The term nanolithography may be used to designate processes that can produce nanoscale features, such as less than 100 nanometres. Microlithography is a microfabrication process that is extensively used in the semiconductor industry and also manufacture microelectromechanical systems. Processes Specific microlithography processes include: * Photolithography using light projected on a photosensitive material film (photoresist). * Electron beam lithography, using a steerable electron beam. * Nanoimprinting * Interference lithography * Magnetolithography * Scanning p ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Projection (physics)
The vector projection (also known as the vector component or vector resolution) of a Vector (geometry), vector on (or onto) a nonzero vector is the orthogonal projection of onto a straight line parallel to . The projection of onto is often written as \operatorname_\mathbf \mathbf or . The vector component or vector resolute of perpendicular to , sometimes also called the vector rejection of ''from'' (denoted \operatorname_ \mathbf or ), is the orthogonal projection of onto the plane (geometry), plane (or, in general, hyperplane) that is orthogonal to . Since both \operatorname_ \mathbf and \operatorname_ \mathbf are vectors, and their sum is equal to , the rejection of from is given by: \operatorname_ \mathbf = \mathbf - \operatorname_ \mathbf. To simplify notation, this article defines \mathbf_1 := \operatorname_ \mathbf and \mathbf_2 := \operatorname_ \mathbf. Thus, the vector \mathbf_1 is parallel to \mathbf, the vector \mathbf_2 is orthogonal to \mathbf, and \ma ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
