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Off-axis Illumination
{{Unreferenced, date=June 2019, bot=noref (GreenC bot) In photolithography, off-axis illumination is an optical system setup in which the incoming light strikes the photomask at an oblique angle rather than perpendicularly to it, that is to say, the incident light is not parallel to the axis of the optical system. The advantages of off-axis illumination can be explained in the context where the pattern on the photomask is a diffraction grating In optics, a diffraction grating is an optical component with a periodic structure that diffracts light into several beams travelling in different directions (i.e., different diffraction angles). The emerging coloration is a form of structura ... with a small pitch. The light that strikes the grating is diffracted in various directions. If the incident light is at a normal angle (along the axis of the optical system), then the zero-th diffracted order continues to be along the optical system axis, while the other orders are diffracted ...
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Photolithography
In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer (electronics), wafer, to protect selected areas of it during subsequent etching, Chemical vapor deposition, deposition, or Ion implantation, implantation operations. Typically, ultraviolet light is used to transfer a geometry, geometric design from an photomask, optical mask to a photosensitivity, light-sensitive chemical (photoresist) coated on the substrate. The photoresist either breaks down or hardens where it is exposed to light. The patterned film is then created by removing the softer parts of the coating with appropriate solvents. Conventional photoresists typically consists of three components: resin, sensitizer, and solvent. Photolithography processes can be classified according to the type of light used, such as ultraviolet, deep ultrav ...
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Photomask
A photomask is an opaque plate with holes or transparencies that allow light to shine through in a defined pattern. They are commonly used in photolithography and the production of integrated circuits (ICs or "chips") in particular. Masks are used to produce a pattern on a substrate, normally a thin slice of silicon known as a wafer in the case of chip manufacturing. Several masks are used in turn, each one reproducing a layer of the completed design, and together they are known as a mask set. Previously, photomasks used to be produced manually by using rubylith and mylar. As complexity continued to grow, manual processing of any sort became difficult. This was solved with the introduction of the optical pattern generator which automated the process of producing the initial large-scale pattern, and the step-and-repeat cameras that automated the copying of the pattern into a multiple-IC mask. The intermediate masks are known as reticles, and were initially copied to production ...
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Diffraction Grating
In optics, a diffraction grating is an optical component with a periodic structure that diffracts light into several beams travelling in different directions (i.e., different diffraction angles). The emerging coloration is a form of structural coloration. The directions or diffraction angles of these beams depend on the wave (light) incident angle to the diffraction grating, the spacing or distance between adjacent diffracting elements (e.g., parallel slits for a transmission grating) on the grating, and the wavelength of the incident light. The grating acts as a dispersive element. Because of this, diffraction gratings are commonly used in monochromators and spectrometers, but other applications are also possible such as optical encoders for high precision motion control and wavefront measurement. For typical applications, a reflective grating has ridges or ''rulings'' on its surface while a transmissive grating has transmissive or hollow slits on its surface. Such a gratin ...
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