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The argon fluoride laser (ArF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 193-nanometer wavelength, it is a deep ultraviolet laser, which is commonly used in the production of semiconductor
integrated circuits An integrated circuit or monolithic integrated circuit (also referred to as an IC, a chip, or a microchip) is a set of electronic circuits on one small flat piece (or "chip") of semiconductor material, usually silicon. Large numbers of tiny ...
, eye surgery, micromachining, and scientific research. "Excimer" is short for "excited dimer", while "exciplex" is short for "excited complex". An excimer laser typically uses a mixture of a
noble gas The noble gases (historically also the inert gases; sometimes referred to as aerogens) make up a class of chemical elements with similar properties; under standard conditions, they are all odorless, colorless, monatomic gases with very low ch ...
(argon, krypton, or xenon) and a halogen gas (fluorine or chlorine), which under suitable conditions of electrical stimulation and high pressure, emits coherent stimulated radiation (laser light) in the ultraviolet range. ArF (and KrF) excimer lasers are widely used in high-resolution
photolithography In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protec ...
machines, a critical technology for
microelectronic Microelectronics is a subfield of electronics. As the name suggests, microelectronics relates to the study and manufacture (or microfabrication) of very small electronic designs and components. Usually, but not always, this means micrometre-s ...
chip manufacturing. Excimer laser lithography has enabled transistor feature sizes to shrink from 800 nanometers in 1990 to 7 nanometers in 2018.
Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is an optical lithography technology used in steppers, machines that make integrated circuits (ICs) for computers and other electronic devices. It uses a range of extreme ultraviolet (EUV ...
machines have replaced ArF photolithography machines in some cases as they enable even smaller feature sizes while increasing productivity, as EUV machines can provide sufficient resolution in fewer steps. The development of excimer laser lithography has been highlighted as one of the major milestones in the 50-year history of the laser.


Theory

An argon fluoride laser absorbs energy from a source, causing the
argon Argon is a chemical element with the symbol Ar and atomic number 18. It is in group 18 of the periodic table and is a noble gas. Argon is the third-most abundant gas in Earth's atmosphere, at 0.934% (9340 ppmv). It is more than twice as ...
gas to react with the
fluorine Fluorine is a chemical element with the symbol F and atomic number 9. It is the lightest halogen and exists at standard conditions as a highly toxic, pale yellow diatomic gas. As the most electronegative reactive element, it is extremely reactiv ...
gas producing argon monofluoride, a temporary
complex Complex commonly refers to: * Complexity, the behaviour of a system whose components interact in multiple ways so possible interactions are difficult to describe ** Complex system, a system composed of many components which may interact with each ...
, in an excited energy state: :2 Ar + → 2 ArF The complex can undergo spontaneous or stimulated emission, reducing its energy state to a metastable, but highly repulsive ground state. The ground state complex quickly dissociates into unbound atoms: :2 ArF → 2 Ar + The result is an exciplex laser that radiates energy at 193 nm, which lies in the
far ultraviolet Ultraviolet (UV) is a form of electromagnetic radiation with wavelength from 10 nm (with a corresponding frequency around 30  PHz) to 400 nm (750  THz), shorter than that of visible light, but longer than X-rays. UV radiation i ...
portion of the
spectrum A spectrum (plural ''spectra'' or ''spectrums'') is a condition that is not limited to a specific set of values but can vary, without gaps, across a continuum. The word was first used scientifically in optics to describe the rainbow of colors ...
, corresponding to an energy difference of 6.4
electron volt In physics, an electronvolt (symbol eV, also written electron-volt and electron volt) is the measure of an amount of kinetic energy gained by a single electron accelerating from rest through an electric potential difference of one volt in vacuum. ...
s between the ground state and the excited state of the complex.


Applications

The most widespread industrial application of ArF excimer lasers has been in deep-ultraviolet
photolithography In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protec ...
for the manufacturing of
microelectronic Microelectronics is a subfield of electronics. As the name suggests, microelectronics relates to the study and manufacture (or microfabrication) of very small electronic designs and components. Usually, but not always, this means micrometre-s ...
devices (i.e., semiconductor
integrated circuits An integrated circuit or monolithic integrated circuit (also referred to as an IC, a chip, or a microchip) is a set of electronic circuits on one small flat piece (or "chip") of semiconductor material, usually silicon. Large numbers of tiny ...
or “chips”). From the early 1960s through the mid-1980s, Hg-Xe lamps were used for lithography at 436, 405 and 365 nm wavelengths. However, with the semiconductor industry’s need for both finer resolution (for denser and faster chips) and higher production throughput (for lower costs), the lamp-based lithography tools were no longer able to meet the industry’s requirements. This challenge was overcome when in a pioneering development in 1982, deep-UV excimer laser lithography was invented and demonstrated at IBM by K. Jain. With advances made in equipment technology in the following two decades, semiconductor electronic devices fabricated using excimer laser lithography reached $400 billion in annual production. As a result, excimer laser lithography (with both ArF and KrF lasers) has been a crucial factor in the continued advance of the so-called
Moore’s law Moore's law is the observation that the number of transistors in a dense integrated circuit (IC) doubles about every two years. Moore's law is an observation and projection of a historical trend. Rather than a law of physics, it is an empir ...
. The UV light from an ArF laser is well absorbed by biological matter and organic compounds. Rather than burning or cutting material, the ArF laser dissociates the molecular bonds of the surface tissue, which disintegrates into the air in a tightly controlled manner through
ablation Ablation ( la, ablatio – removal) is removal or destruction of something from an object by vaporization, chipping, erosive processes or by other means. Examples of ablative materials are described below, and include spacecraft material for a ...
rather than burning. Thus the ArF and other excimer lasers have the useful property that they can remove exceptionally fine layers of surface material with almost no heating or change to the remainder of the material which is left intact. These properties make such lasers well suited to precision micromachining organic materials (including certain polymers and plastics), and especially delicate surgeries such as eye surgery (e.g.,
LASIK LASIK or Lasik (''laser-assisted in situ keratomileusis''), commonly referred to as laser eye surgery or laser vision correction, is a type of refractive surgery for the correction of myopia, hyperopia, and an actual cure for astigmatism, sin ...
, LASEK). Recently, through the use of a novel diffractive diffuse system composed of two microlens arrays,
surface micromachining Surface micromachining builds microstructures by deposition and etching structural layers over a substrate. This is different from Bulk micromachining, in which a silicon substrate wafer is selectively etched to produce structures. Layers Ge ...
by ArF laser on
fused silica Fused quartz, fused silica or quartz glass is a glass consisting of almost pure silica (silicon dioxide, SiO2) in amorphous (non-crystalline) form. This differs from all other commercial glasses in which other ingredients are added which change ...
has been performed with submicrometer accuracy. In 2021, the United States
Naval Research Laboratory The United States Naval Research Laboratory (NRL) is the corporate research laboratory for the United States Navy and the United States Marine Corps. It was founded in 1923 and conducts basic scientific research, applied research, technological ...
began work on an ArF for use in
Inertial confinement fusion Inertial confinement fusion (ICF) is a fusion energy process that initiates nuclear fusion reactions by compressing and heating targets filled with thermonuclear fuel. In modern machines, the targets are small spherical pellets about the size of ...
, providing up to 16% energy efficiency.


Safety

The light emitted by the ArF is invisible to the human eye, so additional safety precautions are necessary when working with this laser to avoid stray beams. Gloves are needed to protect flesh from its potentially
carcinogen A carcinogen is any substance, radionuclide, or radiation that promotes carcinogenesis (the formation of cancer). This may be due to the ability to damage the genome or to the disruption of cellular metabolic processes. Several radioactive substa ...
ic properties, and UV goggles are needed to protect the eyes.


See also

*
Excimer An excimer (originally short for excited dimer) is a short-lived dimeric or heterodimeric molecule formed from two species, at least one of which has a valence shell completely filled with electrons (for example, noble gases). In this case, form ...
* Excimer laser *
Excimer lamp An excimer lamp (or excilamp) is a source of ultraviolet light based on spontaneous emission of excimer (exciplex) molecules. Introduction Excimer lamps are quasimonochromatic light sources operating over a wide range of wavelengths in the ul ...
*
Krypton fluoride laser A krypton fluoride laser (KrF laser) is a particular type of excimer laser, which is sometimes (more correctly) called an exciplex laser. With its 248 nanometer wavelength, it is a deep ultraviolet laser which is commonly used in the production of ...
*
Electrolaser An electrolaser is a type of electroshock weapon that is also a directed-energy weapon. It uses lasers to form an electrically conductive ''laser-induced plasma channel'' (LIPC). A fraction of a second later, a powerful electric current is sent ...
* Nike laser *
Photolithography In integrated circuit manufacturing, photolithography or optical lithography is a general term used for techniques that use light to produce minutely patterned thin films of suitable materials over a substrate, such as a silicon wafer, to protec ...
*
Moore’s law Moore's law is the observation that the number of transistors in a dense integrated circuit (IC) doubles about every two years. Moore's law is an observation and projection of a historical trend. Rather than a law of physics, it is an empir ...


References

{{Excimer lasers Excimer lasers Argon Fluorine