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Photoresists
A photoresist (also known simply as a resist) is a light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coating in areas w ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photoresist Of Photolithography
A photoresist (also known simply as a resist) is a sensitometry, light-sensitive material used in several processes, such as photolithography and photoengraving, to form a patterned coating on a surface. This process is crucial in the electronics industry. The process begins by coating a substrate with a light-sensitive organic material. A patterned mask is then applied to the surface to block light, so that only unmasked regions of the material will be exposed to light. A solvent, called a developer, is then applied to the surface. In the case of a positive photoresist, the photo-sensitive material is degraded by light and the developer will dissolve away the regions that were exposed to light, leaving behind a coating where the mask was placed. In the case of a negative photoresist, the photosensitive material is strengthened (either polymerized or cross-linked) by light, and the developer will dissolve away only the regions that were not exposed to light, leaving behind a coati ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photolithography
Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer. The process begins with a photosensitive material, called a photoresist, being applied to the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist in certain areas. The exposed areas undergo a chemical change, making them either soluble or insoluble in a developer solution. After development, the pattern is transferred onto the substrate through etching, chemical vapor deposition, or ion implantation processes. Ultraviolet, Ultraviolet (UV) light is typically used. Photolithography processes can be classified according to the type of light used, including ultraviolet lithography, deep ultraviolet lithography, extreme ultraviolet lithography, extreme ultraviolet lithography ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Tetramethylammonium Hydroxide
Tetramethylammonium hydroxide (TMAH or TMAOH) is a quaternary ammonium salt with molecular formula N(CH3)4+ OH−. It is commonly encountered in form of concentrated solutions in water or methanol. TMAH in solid state and its aqueous solutions are all colorless, but may be yellowish if impure. Although TMAH has virtually no odor when pure, samples often have a strong fishy smell due to presence of trimethylamine which is a common impurity. TMAH has several diverse industrial and research applications. Chemical properties Structure TMAH is most commonly encountered as an aqueous solution, in concentrations from ~2–25%, and less frequently as solutions in methanol. These solutions are identified by CAS numbe75-59-2 Several hydrates such as N(CH3)4OH·xH2O. have been crystallized. These salts contain well separated Me4N+ cations and hydroxide anions ( Me is an abbreviation of methyl group). The hydroxide groups are linked by hydrogen bonds to the water of crystallization ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
SU-8 Photoresist
SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety. It is these epoxies that cross-link to give the final structure. It can be made into a viscous polymer that can be spun or spread over a thickness ranging from below 1 micrometer up to above 300 micrometers, or Thick Film Dry Sheets (TFDS) for lamination up to above 1 millimetre thick. Up to 500 μm, the resist can be processed with standard contact lithography. Above 500 μm, absorption leads to increasing sidewall undercuts and poor curing at the substrate interface. It can be used to pattern high aspect ratio structures. An aspect ratio of (> 20) has been achieved with the solution formulat ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photoengraving
Photoengraving is a process that uses a light-sensitive photoresist applied to the surface to be engraved to create a mask that protects some areas during a subsequent operation which etches, dissolves, or otherwise removes some or all of the material from the unshielded areas of a substrate. Normally applied to metal, it can also be used on glass, plastic and other materials. A photoresist is selected which is resistant to the particular acid or other etching compound to be used. It may be a liquid applied by brushing, spraying, pouring or other means and then allowed to set, or it may come in sheet form and be applied by laminating. It is then exposed to light—usually strong ultraviolet (UV) light—through a photographic, mechanically printed, or manually created image or pattern on transparent film. Alternatively, a lens may be used to project an image directly onto it. Typically, the photoresist is hardened where it receives sufficient exposure to light, but some photores ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Diazonaphthoquinone
Diazonaphthoquinone (DNQ) is a diazo derivative of naphthoquinone. Upon exposure to light, DNQ converts to a derivative that is susceptible to etching. In this way, DNQ has become an important reagent in photoresist technology in the semiconductor industry. Diazonaphthoquinone sulfonic acid esters are components of common photoresist materials. Such photoresists are used in the manufacture of semiconductors. In this application DNQs are mixed with Novolac resin, a type of phenolic polymer. The DNQ functions as a dissolution inhibitor. During the masking/patterning process, portions of the photoresist film are exposed to light while others remain unexposed. In the unexposed regions of the resist film, the DNQ acts as a dissolution inhibitor and the resist remains insoluble in the aqueous base developer. In the exposed regions, the DNQ forms a ketene In organic chemistry, a ketene is an organic compound of the form , where R and R' are two arbitrary valence (chemistry), mon ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
SU-8
SU-8 is a commonly used epoxy-based negative photoresist. Negative refers to a photoresist whereby the parts exposed to UV become cross-linked, while the remainder of the film remains soluble and can be washed away during development. As shown in the structural diagram, SU-8 derives its name from the presence of 8 epoxy groups. This is a statistical average per moiety. It is these epoxies that cross-link to give the final structure. It can be made into a viscous polymer that can be spun or spread over a thickness ranging from below 1 micrometer up to above 300 micrometers, or Thick Film Dry Sheets (TFDS) for lamination up to above 1 millimetre thick. Up to 500 μm, the resist can be processed with standard contact lithography. Above 500 μm, absorption leads to increasing sidewall undercuts and poor curing at the substrate interface. It can be used to pattern high aspect ratio structures. An aspect ratio of (> 20) has been achieved with the solution formulat ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Deep Ultraviolet
Ultraviolet radiation, also known as simply UV, is electromagnetic radiation of wavelengths of 10–400 nanometers, shorter than that of visible light, but longer than X-rays. UV radiation is present in sunlight and constitutes about 10% of the total electromagnetic radiation output from the Sun. It is also produced by electric arcs, Cherenkov radiation, and specialized lights, such as mercury-vapor lamps, tanning lamps, and black lights. The photons of ultraviolet have greater energy than those of visible light, from about 3.1 to 12 electron volts, around the minimum energy required to ionize atoms. Although long-wavelength ultraviolet is not considered an ionizing radiation because its photons lack sufficient energy, it can induce chemical reactions and cause many substances to glow or fluoresce. Many practical applications, including chemical and biological effects, are derived from the way that UV radiation can interact with organic molecules. These i ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Photon Energy
Photon energy is the energy carried by a single photon. The amount of energy is directly proportional to the photon's electromagnetic frequency and thus, equivalently, is inversely proportional to the wavelength. The higher the photon's frequency, the higher its energy. Equivalently, the longer the photon's wavelength, the lower its energy. Photon energy can be expressed using any energy unit. Among the units commonly used to denote photon energy are the electronvolt (eV) and the joule (as well as its multiples, such as the microjoule). As one joule equals , the larger units may be more useful in denoting the energy of photons with higher frequency and higher energy, such as gamma rays, as opposed to lower energy photons as in the optical and radio frequency regions of the electromagnetic spectrum. Formulas Physics Photon energy is directly proportional to frequency. E = hf where * E is energy ( joules in the SI system) * h is the Planck constant * f is frequency T ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Valence Band
In solid-state physics, the valence band and conduction band are the bands closest to the Fermi level, and thus determine the electrical conductivity of the solid. In nonmetals, the valence band is the highest range of electron energies in which electrons are normally present at absolute zero temperature, while the conduction band is the lowest range of vacant electronic states. On a graph of the electronic band structure of a semiconducting material, the valence band is located below the Fermi level, while the conduction band is located above it. The distinction between the valence and conduction bands is meaningless in metals, because conduction occurs in one or more partially filled bands that take on the properties of both the valence and conduction bands. Band gap In semiconductors and insulators the two bands are separated by a band gap, while in conductors the bands overlap. A band gap is an energy range in a solid where no electron states can exist due to th ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
Sensitometry
Sensitometry is the scientific study of light-sensitive materials, especially photographic film. The study has its origins in the work by Ferdinand Hurter and Vero Charles Driffield (circa 1876) with early black-and-white emulsions. They determined how the density of silver produced varied with the amount of light received, and the method and time of development. Details Plots of film density (log of opacity) versus the log of exposure are called characteristic curves, Hurter–Driffield curves, H–D curves, HD curves, H & D curves, D–logE curves, or D–logH curves. At moderate exposures, the overall shape is typically a bit like an "S" slanted so that its base and top are horizontal. There is usually a central region of the HD curve which approximates to a straight line, called the "linear" or "straight-line" portion; the slope of this region is called the gamma. The low end is called the "toe", and at the top, the curve rounds over to form the "shoulder". At extremel ... [...More Info...] [...Related Items...] OR: [Wikipedia] [Google] [Baidu] |
